Method and apparatus of reviewing defects on a semiconductor device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7764826
APP PUB NO 20070145270A1
SERIAL NO

11634963

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Abstract

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To realize reliable on-film/under-film defect classification (classification into 3 classes of on-film, under-film, and determination-disabled) with determination propriety determination, an on-film/under-film defect classification method and a method of narrowing a range of defect generation timing are given, the methods being robust to 4 variation factors, wherein an edge of a boundary line between a line pattern region and a base region is focused, and whether the edge is preserved between defect and reference images in a defective region is determined, thereby an on-film or under-film defect can be identified. Furthermore, a range of the defect generation timing can be narrowed based on an identification result of the on-film or under-film defect, and information of a defect classification class (defect type) such as particle defect or pattern defect as necessary.

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Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH-TECH CORPORATION17-1 TORANOMON 1-CHOME MINATO-KU TOKYO 1056409 ?1056409

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honda, Toshifumi Yokohama, JP 130 1458
Miyamoto, Atsushi Yokohama, JP 195 2445

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