Pattern match based optical proximity correction and verification of integrated circuit layout
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United States of America Patent
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Jul 27, 2010
Grant Date -
Aug 7, 2008
app pub date -
Feb 3, 2007
filing date -
Feb 3, 2007
priority date (Note) -
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Abstract
A method for applying optical proximity correction (OPC) to a circuit layout, includes storing distinct defect patterns in a defect pattern library and modifying the circuit layout to fix defect pattern. The method also includes storing a distinct patterns in an OPC pattern library storing one or more post-OPC targets in association with one of distinct patterns in the OPC pattern library, wherein the one or more post-OPC targets are configured to correct optical proximity effects of the associated distinct pattern. The method further includes identifying in the circuit layout a pattern that has substantially the same optical proximity environment as the one of the distinct patterns in the OPC pattern library; and applying OPC to the identified pattern using the one or more post-OPC targets associated with the one of the distinct pattern in the OPC pattern library.
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