Substrate drying apparatus, substrate cleaning apparatus and substrate processing system
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United States of America Patent
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Aug 3, 2010
Grant Date -
Jan 4, 2007
app pub date -
Jun 27, 2006
filing date -
Jul 1, 2005
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A substrate processing system includes a substrate processing apparatus and a cleaning/drying apparatus. The substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block and a first interface block. The cleaning/drying apparatus includes a cleaning/drying processing block and a second interface block. An exposure device is arranged adjacent to the second interface block. In the cleaning/drying processing block, cleaning processing is applied to a substrate before exposure processing and drying processing is applied to the substrate after the exposure processing.
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