AlRu sputtering target and manufacturing method thereof
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United States of America Patent
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Aug 3, 2010
Grant Date -
Aug 2, 2007
app pub date -
Apr 9, 2007
filing date -
Jun 24, 2002
priority date (Note) -
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status (Latency Note)
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Abstract
An AlRu sputtering target that is a sintered body composed of an AlRu intermetallic compound of 95 vol. % or more is provided. It is manufactured by a stable and low-cost method that provides it with an even texture, significantly reduces oxygen, prevents or suppresses the generation of particles, and improves the yield ratio of deposition goods.
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