Illumination of a patterning device based on interference for use in a maskless lithography system
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United States of America Patent
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Aug 3, 2010
Grant Date -
Dec 18, 2008
app pub date -
Jun 14, 2007
filing date -
Jun 14, 2007
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Abstract
A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the array of individually controllable elements is projected onto a substrate.
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