Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD deposition
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United States of America Patent
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Aug 10, 2010
Grant Date -
Sep 14, 2006
app pub date -
May 4, 2006
filing date -
Dec 10, 2003
priority date (Note) -
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Abstract
The present disclosure provides methods and systems for controlling temperature. The method has particular utility in connection with controlling temperature in a deposition process, e.g., in depositing a heat-reflective material via CVD. One exemplary embodiment provides a method that involves monitoring a first temperature outside the deposition chamber and a second temperature inside the deposition chamber. An internal temperature in the deposition chamber can be increased in accordance with a ramp profile by (a) comparing a control temperature to a target temperature, and (b) selectively delivering heat to the deposition chamber in response to a result of the comparison. The target temperature may be determined in accordance with the ramp profile, but the control temperature in one implementation alternates between the first temperature and the second temperature.
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