Image sensor and fabricating method thereof

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United States of America Patent

PATENT NO 7772626
APP PUB NO 20090127600A1
SERIAL NO

12271887

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An image sensor and fabricating method thereof are disclosed by which damage to a protective layer can be prevented in a manner of reducing thermal stress of an uppermost metal line in performing thermal treatment for enhancing the dark characteristic. Such damage can be prevented by forming a poly layer pattern in an insulating interlayer on at least one side of the uppermost layer metal line.

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Patent Owner(s)

Patent OwnerAddress
DB HITEK CO LTD(DAECHI-DONG) 432 TEHERAN-RO GANGNAM-GU SEOUL 06194

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Sung-Moo Eumseong-gun, KR 4 20

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