US Patent No: 7,773,199

Number of patents in Portfolio can not be more than 2000

Methods and systems to compensate for a stitching disturbance of a printed pattern

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ALSO PUBLISHED AS: 20080094596
ATTORNEY / AGENT: (SPONSORED)
 

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Abstract

A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
ASML HOLDING N.V.VELDHOVEN496

International Classification(s)

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  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bleeker, Arno Westerhoven, NL 16 52
Cebuhar, Wenceslao A Norwalk, CT 27 86
Kreuzer, Justin Trumball, CT 18 152
Latypov, Azat Danbury, CT 18 64
Vladimirsky, Yuli Weston, CT 34 186

Cited Art

Patent Info (Count) # Cites Year
 
ASML HOLDING N.V. (10)
2004/0239,901 System and method for producing gray scaling using multiple spatial light modulators in a maskless lithography system 9 2003
6,876,440 METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A PRINTED PATTERN IN A MASKLESS LITHOGRAPHY SYSTEM UTILIZING OVERLAP OF EXPOSURE ZONES WITH ATTENUATION OF THE AERIAL IMAGE IN THE OVERLAP REGION 8 2003
7,023,526 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation 9 2003
7,410,736 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 5 2003
7,133,121 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 6 2005
7,259,831 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation 4 2006
2007/0146,672 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 5 2006
2008/0079,923 Methods, Systems, and Computer Program Products for Printing Patterns on Photosensitive Surfaces 3 2007
2008/0094,595 Methods and systems to compensate for a stitching disturbance of a printed pattern 3 2007
2009/0033,893 Methods and Systems to Compensate for a Stitching Disturbance of a Printed Pattern in a Maskless Lithography System Not Utilizing Overlap of the Exposure Zones 3 2008
 
ASML NETHERLANDS B.V. (6)
6,399,261 Pattern generator with improved precision 30 2000
6,428,940 Method for pattern generation with improved image quality 38 2000
6,747,783 Pattern generator 221 2000
6,285,488 Pattern generator for avoiding stitching errors 102 2000
6,717,097 Data path for high performance pattern generator 30 2002
7,405,414 Method and apparatus for patterning a workpiece 9 2002
 
NIKON CORPORATION (4)
5,500,736 Method of detecting positions 215 1994
5,579,147 Scanning light exposure apparatus 227 1994
6,811,953 Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice 216 2001
6,795,169 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 213 2003
 
TEXAS INSTRUMENTS INCORPORATED (3)
5,523,193 Method and apparatus for patterning and imaging member 442 1994
5,677,703 Data loading circuit for digital micro-mirror device 220 1995
5,530,482 Pixel data processing for spatial light modulator having staggered pixels 234 1995
 
ANVIK CORPORATION (2)
6,312,134 Seamless, maskless lithography system using spatial light modulator 91 1999
6,717,650 Maskless lithography with sub-pixel resolution 32 2002
 
SILICON LIGHT MACHINES CORPORATION (2)
5,808,797 Method and apparatus for modulating a light beam 317 1996
5,982,553 Display device incorporating one-dimensional grating light-valve array 334 1997
 
CANON KABUSHIKI KAISHA (1)
6,608,667 Exposure apparatus and device manufacturing method 4 2001
 
DAINIPPON SCREEN MFG. CO., LTD. (1)
6,806,897 Image recording apparatus using the grating light valve 212 2002
 
DISCO CORPORATION (1)
6,537,738 System and method for making smooth diagonal components with a digital photolithography system 19 2000
 
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (1)
5,296,891 Illumination device 430 1992
 
ROBERT BOSCH GMBH (1)
6,687,041 Pattern generator using EUV 222 2000
 
THE B. F. GOODRICH COMPANY (1)
5,229,872 Exposure device including an electrically aligned electronic mask for micropatterning 384 1992
 
ULTRATECH STEPPER, INC. (1)
5,691,541 Maskless, reticle-free, lithography 134 1996
 
OTHER [CHECK PATENT PROFILE FOR ASSIGNMENT INFORMATION] (3)
6,133,986 Microlens scanner for microlithography and wide-field confocal microscopy 320 1997
6,177,980 High-throughput, maskless lithography system 278 1999
6,498,685 Maskless, microlens EUV lithography system 100 2000

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