Ampoule for liquid draw and vapor draw with a continuous level sensor
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United States of America Patent
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Aug 17, 2010
Grant Date -
May 1, 2008
app pub date -
Oct 31, 2006
filing date -
Oct 31, 2006
priority date (Note) -
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Abstract
A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.
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