Methods, systems, and computer program products for printing patterns on photosensitive surfaces
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United States of America Patent
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Aug 17, 2010
Grant Date -
Apr 3, 2008
app pub date -
Aug 9, 2007
filing date -
Sep 30, 2003
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method, system, and computer program product are provided for printing a pattern on a photosensitive surface using a maskless lithography system including a spatial light modulator (SLM). The method, system, and computer program product define two or more exposure areas within a predetermined region of the surface, each area corresponding to selected pixels of the SLM. An overlap region is formed between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, the overlapping edges corresponding to overlapping pairs of the selected pixels from each area. The pixels within each pair are alternately activated such that only one of the pixels within the pair is used to produce the pattern.
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