Internal member of a plasma processing vessel
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United States of America Patent
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Aug 24, 2010
Grant Date -
Nov 4, 2004
app pub date -
Nov 28, 2003
filing date -
Nov 28, 2002
priority date (Note) -
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Abstract
An internal member of a plasma processing vessel includes a base material and a film formed by thermal spraying of ceramic on a surface of the base material. The film is formed of ceramic which includes at least one kind of element selected from the group consisting of B, Mg, Al, Si, Ca, Cr, Y, Zr, Ta, Ce and Nd. In addition, at least a portion of the film is sealed by a resin.
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