Method for cleaning a surface of a photomask

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7789964
APP PUB NO 20070113866A1
SERIAL NO

11584156

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Abstract

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in a supercritical state, to the vessel. An additive, such as alcohol, water ketones, esters, surfactants, and organic solvents, can be added to the fluid. The vessel can be held under a pressure higher than the critical pressure of the fluid and at a temperature higher than the critical temperature of the fluid.

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Patent Owner(s)

Patent OwnerAddress
ADVANCED MASK TECHNOLOGY CENTER GMBH & CO KG01109 DRESDEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chovino, Christian Dresden, DE 4 12
Lamantia, Matthew Dresden, DE 4 9

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