Treatment of substrate using functionalizing agent in supercritical carbon dioxide

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United States of America Patent

PATENT NO 7789971
APP PUB NO 20060254615A1
SERIAL NO

10908474

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Abstract

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and are more easily removed than their predecessors.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kevwitch, Robert Chandler, US 10 63

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