Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
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United States of America Patent
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Sep 14, 2010
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app pub date -
Oct 26, 2007
filing date -
May 12, 2004
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Abstract
The embodiments of the invention describe a process chamber, such as an ALD chamber, that has gas delivery conduits with gradually increasing diameters to reduce Joule-Thompson effect during gas delivery, a ring-shaped gas liner leveled with the substrate support to sustain gas temperature and to reduce gas flow to the substrate support backside, and a gas reservoir to allow controlled delivery of process gas. The gas conduits with gradually increasing diameters, the ring-shaped gas liner, and the gas reservoir help keep the gas temperature stable and reduce the creation of particles.
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