Polyoxymethylene multi-block copolymers, their production and use

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United States of America Patent

PATENT NO 7795357
APP PUB NO 20060160938A1
SERIAL NO

10570643

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Abstract

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Multiblock copolymers are described and contain the structural unit of formula I -A-O--R.sup.1--O--CO--(R.sup.2--CO--).sub.m--X-D-X--(CO--R.sup.- 2).sub.m--CO--X-- (I), where A is a radical derived from a homo- or copolyoxymethylene, R.sup.1 is an alkylene radical-having at least two carbon atoms or a cycloalkylene radical, R.sup.2 is a direct carbon-carbon bond, or an alkylene, cycloalkylene, arylene, or aralkylene radical, X is selected from --O--, --S--, or --NH--, D is a divalent radical B which is a radical of a hydroxy-terminated, mercaptan-terminated, or amino-terminated polymer which derives from polyalkylene glycols, polyvinyl ethers, polyvinyl ether-alkene copolymers, polyvinyl esters, polyvinyl ester-alkene copolymers, polyvinyl alcohols, polyvinyl alcohol-alkene copolymers, polyvinylaromatics, polyacrylates, polymethacrylates, polyacetals, polycarbonates, polyesters, polyamides, polyimines, polyetherester elastomers, polyetheramide elastomers, polyalkadienes, polyurethanes, polyureas, polysiloxanes, or a triblock copolymer radical -PAO-B-PAO-, where B assumes one of the above meanings and PAO is a polyalkylene oxide radical, and m is 0 or 1. The multiblock copolymers may be used to produce moldings.

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Patent Owner(s)

Patent OwnerAddress
TICONA GMBHAN DER B 43 65451 KELSTERBACH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kurz, Klaus Kelsterbach, DE 53 404
Mück, Karl-Friedrich Wiesbaden, DE 3 23
Schiebisch, Jens Freigericht, DE 4 50
Schmalz, Holger Bayreuth, DE 2 17
Zierer, Dirk Hofheim, DE 27 74

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