Aberration measurement apparatus and aberration measurement method

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United States of America Patent

PATENT NO 7796245
APP PUB NO 20090009751A1
SERIAL NO

12043657

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Abstract

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An aberration measurement apparatus measures the aberration of an imaging optical system. The apparatus includes an illumination system, a separation member, and a measurement unit. The illumination system supplies the imaging optical system with measurement light used to measure an aberration of the imaging optical system and background light different from the measurement light. The separation member separates the measurement light and the background light which have passed through the imaging optical system. The measurement unit measures the aberration of the imaging optical system on the basis of the measurement light separated by the separation member.

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Patent OwnerAddress
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO LTD66-2 HORIKAWA-CHO SAIWAI-KU KAWASAKI-SHI KANAGAWA 212-0013

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Taniguchi, Yukio Yokohama, JP 107 1655

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