US Patent No: 7,796,801

Number of patents in Portfolio can not be more than 2000

Pattern inspection apparatus and method

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ALSO PUBLISHED AS: 20060245636
ATTORNEY / AGENT: (SPONSORED)
 

Importance

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Abstract

A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.

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First Claim

Related Publications

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Patent Owner(s)

Patent OwnerAddressTotal Patents
NGR INC.TOKYO, JP9

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hasebe, Toshiaki Tokyo, JP 9 52
Kitamura, Tadashi Kanagawa-ken, JP 39 276
Kubota, Kazufumi Kawasaki, JP 15 180
Nakazawa, Shinichi Shibukawa, JP 9 85
Vohra, Neeti Kawasaki, JP 6 85
Yamamoto, Masahiro Yokohama, JP 318 2187

Cited Art

Patent Info (Count) # Cites Year
 
NEC CORPORATION (5)
6,049,895 Failure analyzer with distributed data processing network and method used therein 16 1997
6,040,911 Reference image forming method and pattern inspection apparatus 21 1998
6,356,300 Automatic visual inspection apparatus automatic visual inspection method and recording medium having recorded an automatic visual inspection program 26 1999
6,504,947 Method and apparatus for multi-level rounding and pattern inspection 15 1999
6,400,839 Reticle inspecting apparatus capable of shortening an inspecting time 12 1999
 
HITACHI, LTD. (4)
5,051,585 Apparatus and method of pattern detection based on a scanning transmission electron microscope 40 1989
5,801,965 Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices 132 1994
6,047,083 Method of and apparatus for pattern inspection 49 1998
6,546,308 Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices 26 2001
 
DAINIPPON SCREEN MFG. CO., LTD. (3)
5,046,113 Method of and apparatus for detecting pattern defects by means of a plurality of inspecting units each operating in accordance with a respective inspecting principle 34 1989
5,379,350 Method and apparatus for extracting a contour of an image 24 1993
5,764,793 Method of and apparatus for inspecting pattern defects 15 1995
 
NIKON CORPORATION (3)
4,589,139 Apparatus for detecting defects in pattern 27 1983
5,046,109 Pattern inspection apparatus 75 1990
5,479,537 Image processing method and apparatus 25 1992
 
ORBOTECH LTD. (3)
7,206,443 Apparatus and methods for the inspection of objects 22 2000
7,181,059 Apparatus and methods for the inspection of objects 17 2003
7,388,978 Apparatus and methods for the inspection of objects 14 2003
 
FREESCALE SEMICONDUCTOR, INC. (2)
5,137,362 Automatic package inspection method 26 1990
5,129,009 Method for automatic semiconductor wafer inspection 48 1990
 
KLA INSTRUMENTS CORPORATION (2)
4,805,123 Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems 193 1986
5,563,702 Automated photomask inspection apparatus and method 182 1994
 
APPLIED INTELLIGENT SYSTEMS, INC. (1)
6,023,530 Vector correlation system for automatically locating patterns in an image 62 1995
 
APPLIED MATERIALS, INC. (1)
6,539,106 Feature-based defect detection 91 1999
 
CARBOLOY INC., A DE. CORP. (1)
4,583,854 High resolution electronic automatic imaging and inspecting system 22 1983
 
COGNEX CORPORATION (1)
5,796,868 Object edge point filtering system for machine vision 68 1995
 
FUJITSU LIMITED (1)
5,600,734 Electron beam tester 21 1994
 
HONDA GIKEN KOGYO KABUSHIKI KAISHA (1)
5,398,292 Edge detecting apparatus 79 1993
 
KABUSHIKI KAISHA TOSHIBA (1)
5,574,800 Pattern defect inspection method and apparatus 36 1994
 
MATSUSHITA ELECTRIC WORKS, LTD. (1)
6,222,935 Pattern inspecting method and pattern inspecting device 22 1999
 
MITSUBISHI DENKI KABUSHIKI KAISHA (1)
5,270,796 Apparatus for inspecting a phase shift mask 17 1991
 
NGR INC. (1)
6,868,175 Pattern inspection apparatus, pattern inspection method, and recording medium 53 2000
 
SII NANOTECHNOLOGY INC. (1)
6,399,953 Scanning electronic microscope and method for automatically observing semiconductor wafer 9 1999
 
TOSHIBA ENGINEERING CORPORATION (1)
6,535,621 Defect integrated processing apparatus and method thereof 15 1999
 
XEROX CORPORATION (1)
5,533,144 Anti-counterfeit pattern detector and method 41 1994

Patent Citation Ranking

Forward Cites

Patent Info (Count) # Cites Year
 
HITACHI HIGH-TECHNOLOGIES CORPORATION (4)
7,884,322 Scanning electron microscope and a method for pattern composite inspection using the same 0 2007
8,086,022 Electron beam inspection system and an image generation method for an electron beam inspection system 1 2008
8,090,190 Method and apparatus for reviewing defects 0 2010
8,173,962 Pattern displacement measuring method and pattern measuring device 0 2010
 
NGR INC. (3)
7,983,471 Pattern inspection apparatus and method 1 2007
8,045,785 Pattern inspection apparatus and method 0 2010
8,285,031 Pattern inspection apparatus and method 0 2011
 
HERMES MICROVISION, INC. (1)
8,068,662 Method and system for determining a defect during charged particle beam inspection of a sample 0 2009
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
8,108,804 Short path customized mask correction 1 2009
 
KLA-TENCOR CORPORATION (1)
8,155,428 Memory cell and page break inspection 0 2008
 
SAMSUNG ELECTRONICS CO., LTD. (1)
8,423,920 Method of forming photomask by collecting verification data based on a layout of contour patterns 0 2011
 
UNITED MICROELECTRONICS CORP. (1)
8,434,030 Integrated circuit design and fabrication method by way of detecting and scoring hotspots 0 2012

Maintenance Fees

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3.5 Year Payment $1600.00 $800.00 $400.00 Mar 14, 2014
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