Chlorine resistant polyamides and membranes made from the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7806275
APP PUB NO 20080277333A1
SERIAL NO

11746140

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A chlorine resistant polyamide is formed from the reaction product of an amine and an acid chloride monomer wherein the acid chloride monomer is modified with electron-withdrawing groups that exhibit sufficient activity to (i) minimize any chlorination on both the amine and acid chloride side and (ii) minimize N-chlorination. A membrane is made from the polyamide and, in one application, the membrane is used in a desalination unit.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
COLORADO SEMINARY WHICH OWNS AND OPERATES THE UNIVERSITY OF DENVER2199 SOUTH UNIVERSITY BLVD DENVER CO 80208
SEPARATION SYSTEMS TECHNOLOGY INC4901 MORENA BOULEVARD SUITE 809 SAN DIEGO CA 92117
GOVERNMENT OF THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE INTERIOR THE BUREAU OF RECLAMATIONDENVER FEDERAL CENTER 6TH & KIPLING BUILDING 56 86-69000 DENVER CO 80225

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Murphy, Andrew Patrick Littleton, US 5 38
Murugaverl, Balasingam Golden, US 2 37
Riley, Robert Lee La Jolla, US 6 40

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation