Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle
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United States of America Patent
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Oct 12, 2010
Grant Date -
Jan 8, 2009
app pub date -
Aug 27, 2008
filing date -
Jul 18, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A reticle has a mask substrate, a test pattern established on the mask substrate having an asymmetrical diffraction grating so as to generate positive first order diffracting light and negative first order diffracting light in different diffraction efficiencies, and a device pattern adjacent to the test pattern established on the mask substrate.
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