Pattern inspection apparatus and method
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United States of America Patent
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Oct 19, 2010
Grant Date -
Jul 7, 2005
app pub date -
Feb 16, 2005
filing date -
Aug 26, 1999
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A pattern inspection apparatus is used for inspecting a pattern, such as semiconductor integrated circuit (LSI), liquid crystal panel, and a photomask by using an image of the pattern to-be-inspected and design data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device for generating a reference pattern represented by one or more lines from design data, an image generation device for generating the image of the pattern to-be-inspected, a detecting device for detecting an edge of the image of the pattern to-be-inspected, and an inspection device for inspecting the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
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