Cartesian cluster tool configuration for lithography type processes
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United States of America Patent
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Oct 26, 2010
Grant Date -
Jun 28, 2007
app pub date -
Sep 8, 2006
filing date -
Dec 22, 2004
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Abstract
The present invention generally provides an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that is easily configurable, has an increased system throughput, increased system reliability, improved device yield performance, a more repeatable wafer processing history (or wafer history), and a reduced footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, and then certain portions of the photosensitive material are removed in a developing process completed in the cluster tool.
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