System and method for compensating for radiation induced thermal distortions in a substrate or projection system
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United States of America Patent
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Nov 9, 2010
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N/A
app pub date -
Oct 25, 2005
filing date -
Oct 4, 2005
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Abstract
A system and method are used to compensate for thermal effect on a lithographic apparatus. The system comprises a patterning device, a projection system, a substrate position controller, and a substrate-position-based expansion-compensator. The patterning device modulates a radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The substrate position controller moves the substrate relative to the projection system sequentially through a plurality of exposure positions. The substrate-position-based expansion-compensator interacts with the substrate position controller to modify the exposure positions in order at least partially to compensate for thermally-induced geometrical changes of at least one of the substrate and projection system.
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