Method and device for correcting SLM stamp image imperfections
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United States of America Patent
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Nov 30, 2010
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N/A
app pub date -
Feb 5, 2008
filing date -
Nov 12, 2003
priority date (Note) -
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Abstract
The invention relates to production and precision patterning of work pieces, including manufacture of photomask for photolithography and direct writing on other substrates, such as semiconductor substrates. In particular, it relates to applying corrections to pattern data, such as corrections for distortions in the field of an SLM exposure stamp. It may be used to produce a device on a substrate. Alternatively, the present invention may be practiced as a device practicing disclosed methods or as an article of manufacture, particularly a memory, either volatile or non-volatile memory, including a program adapted to carry out the disclosed methods.
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