Cleaning method used in removing contaminants from a solid yttrium oxide-containing substrate
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United States of America Patent
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Dec 7, 2010
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Nov 3, 2006
filing date -
Feb 14, 2002
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Abstract
, a water absorbency of about 0.02% or less, and an average grain size within the range of about 10 μm to about 25 μm. Also disclosed herein are methods for fabricating and cleaning the yttrium oxide-comprising gas distribution plate.
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