Composition for removing an insulation material, method of removing an insulation layer and method of recycling a substrate using the same

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United States of America Patent

PATENT NO 7851372
SERIAL NO

11540604

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Abstract

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In one aspect, a composition is provided which is capable of removing an insulation material which includes at least one of a low-k material and a passivation material. The composition of this aspect includes about 5 to about 40 percent by weight of a fluorine compound, about 0.01 to about 20 percent by weight of a first oxidizing agent, about 10 to about 50 percent by weight of a second oxidizing agent, and a remaining water.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTD129 SAMSUNG-RO YEONGTONG-GU SUWON-SI GYEONGGI-DO 16677
TECHNO SEMICHEM CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baek, Kui-Jong Daejeon, KR 10 72
Hahn, Woong Chungcheongnam-do, KR 14 95
Kang, Dong-Min Gyeonggi-do, KR 45 305
Kim, Hyun-Joon Seoul, KR 31 210
Kim, Young-Nam Gyeonggi-do, KR 49 1117
Lee, Chun-Deuk Gyeonggi-do, KR 7 45
Lim, Jung-Hun Daejeon, KR 16 67

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