Method and system for measuring patterned structures
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United States of America Patent
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Jan 4, 2011
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app pub date -
Nov 24, 2009
filing date -
Jul 9, 1999
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Abstract
A method of preparation of reference data for measuring the profile of a patterned structure for use in control of a manufacturing process, the method including: providing a model for generating profiles based on the manufacturing process; generating the profiles by simulation of the manufacturing process; and preparing diffraction signal reference data corresponding to the generated profiles.
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