Polishing pad

United States of America Patent

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Jan 11, 2011
Grant Date
Mar 13, 2008
app pub date
Dec 19, 2005
filing date
Dec 29, 2004

priority date (Note)
Expired

status (Latency Note)

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Abstract

A polishing pad having a novel structure, which is applicable to highly accurate various polishing process, such as a CMP process, is provided. An annular rear plane groove (22) extending in a circumferential direction is formed on a rear plane (20) of the polishing pad.

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Patent Owner(s)

Patent Owner	Address
INOAC CORPORATION	AICHI
TOHO ENGINEERING KABUSHIKI KAISHA	443 AZA KAWANOSHITA YAMAKE-CHO YOKKAICHI-SHI MIE 512-8041

International Classification(s)

B24D:TOOLS FOR GRINDING, BUFFING, OR SHARPENING

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Suzuki, Tatsutoshi	Yokkaichi, JP	16	150

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Polishing pad

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United States of America Patent

11813141

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PATENT NO	7867066
APP PUB NO	20080064311A1
SERIAL NO	11813141
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
January 11, 2011	US,7867066,B2 US7867066B2	GRANTED PATENT AS SECOND PUBLICATION
March 13, 2008	US,20080064311,A1 US20080064311A1	FIRST PUBLISHED PATENT APPLICATION

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11813141

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