Laser ablation resist

United States of America Patent

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Jan 11, 2011
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Dec 6, 2007
app pub date
May 30, 2006
filing date
May 30, 2006

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Abstract

A method of making micro-structure devices by coating a first layer of resist (12) on a substrate (10). A pattern is created on the substrate by radiation induced thermal removal of the resist.

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Patent Owner	Address
EASTMAN KODAK COMPANY	343 STATE STREET ROCHESTER NY 14650-2201

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G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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Inventor Name	Address	# of filed Patents	Total Citations
Nguyen, Kelvin	Corning, US	41	713
Pearce, Glenn T	Webster, US	26	249
Phillips, Scott E	Rochester, US	5	152
Tredwell, Timothy J	Fairport, US	110	3093
Tutt, Lee W	Webster, US	123	1798
Wexler, Ronald M	Rochester, US	40	492

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Laser ablation resist

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United States of America Patent

11420817

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PATENT NO	7867688
APP PUB NO	20070281247A1
SERIAL NO	11420817
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
January 11, 2011	US,7867688,B2 US7867688B2	GRANTED PATENT AS SECOND PUBLICATION
December 06, 2007	US,20070281247,A1 US20070281247A1	FIRST PUBLISHED PATENT APPLICATION

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11420817

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