Method for manufacturing a microstructure, exposure device, and electronic apparatus
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United States of America Patent
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Jan 11, 2011
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app pub date -
Jun 16, 2005
filing date -
Aug 25, 2004
priority date (Note) -
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Abstract
Aspects of the invention can provide a method for manufacturing a microstructure, including forming a photosensitive film above a work piece, exposing the photosensitive film, as a first exposure, by irradiating interference light generated by intersecting two laser beams having a wavelength shorter than a wavelength of visible light, developing the exposed photosensitive film so as to develop a shape corresponding to a pattern of the interference light to the photosensitive film, and etching the work piece using the developed photosensitive film as an etching mask.
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