Arrangement and method for preventing the depolarization of linear-polarized light during the transmission of light through crystals
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United States of America Patent
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Jan 18, 2011
Grant Date -
Apr 24, 2008
app pub date -
Oct 18, 2007
filing date -
Oct 23, 2006
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A process and a device is described to avoid the depolarization of linear-polarized light during the transmission of light through crystals exhibiting a {111} or {100} crystal plane, respectively, and a <100> or <111> crystal axis, respectively. The device is characterized in that the linear-polarized light meets the surface of the crystals in an angle of 45-75°, whereby the surface is formed by the {111} or the {100} plane. The crystal is arranged in such a way that upon entering the crystal, the light spreads along the <100> or <111> crystal axis, respectively, as parallel as possible, and/or that the device comprises a unit for temperature equalization to avoid a thermal gradient in the crystal. Preferably the device is used in DUV lithography, in particular in steppers and excimer lasers, as well as for the production of integrated circuits, computer chips as well as electronic devices such as computers, and other devices that comprise chip-type integrated circuits, as well as for flat screens.
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