Advanced process control framework using two-dimensional image analysis
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United States of America Patent
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Jan 25, 2011
Issued Date -
N/A
app pub date -
May 1, 2006
filing date -
May 1, 2006
priority date (Note) -
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status (Latency Note)
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Abstract
The claimed subject matter provides a system and/or a method that facilitates utilizing a resolution enhancement for a circuit feature. A scanning electron microscope component (104, 204, 304, 404) can provide at least one two-dimensional image of the circuit feature. An image analysis engine (106, 206, 306, 406) can analyze the two-dimensional image. An advanced process control (APC) engine (108, 208, 308, 408) can generate at least one instruction for at least one of a feed forward control and a feedback control and a process component (102, 202, 302, 402) can utilize the at least one instruction to minimize an error.
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