Internally located return electrode electrosurgical apparatus, system and method
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United States of America Patent
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Feb 1, 2011
Grant Date -
Sep 6, 2007
app pub date -
Mar 2, 2006
filing date -
Mar 2, 2006
priority date (Note) -
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Abstract
A bipolar, plasma-generating electrosurgical apparatus and system wherein the return electrode is enclosed within an electrosurgical shaft, and the active electrode is located on the outside surface of the shaft such that in treating the tissue, the tissue is exposed to plasma generated on the active electrode, but is minimally exposed to electric fields generated between the active and return electrodes. Due to the configuration of the electrodes, electric fields generated between the electrodes are directed away from the target tissue and inwardly towards the return electrode within the shaft, thereby electrical stimulation of neuromuscular structures in the tissue by the electric fields is minimized.
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