Aqueous cleaning composition and method for using same
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United States of America Patent
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Feb 1, 2011
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app pub date -
Oct 13, 2005
filing date -
Oct 13, 2005
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Abstract
An aqueous-based composition and method comprising same for removing residues such as without limitation post-ashed and/or post-etched photoresist from a substrate is described herein. In one aspect, there is provided a composition for removing residues comprising: water; at least one selected from a hydroxylamine, a hydroxylamine salt compound, and mixtures thereof; and a corrosion inhibitor wherein the composition is substantially free of an added organic solvent and provided that the corrosion inhibitor does not contain a water soluble organic acid.
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