lens blanks especially for 193 nm and 157 nm lithography with minimized deffects

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Feb 8, 2011
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Dec 6, 2007
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Feb 23, 2005
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Feb 23, 2004

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Abstract

blanks. In conclusion we achieved a strong improvement of the critical parameters of both refractive index homogeneity and striae for large size lens blanks up to 270 mm diameter.

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HELLMA MATERIALS GMBH & CO KG	07745 JENA

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G01N:INVESTIGATING OR ANALYSING MATERIALS BY DETERMININ....

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Inventor Name	Address	# of filed Patents	Total Citations
Foerster, Erik	Lengenfeld, DE	3	51
Parthier, Lutz	Kleinmachnow, DE	32	112
Selle, Michael	Kleinmoelsen, DE	3	26

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lens blanks especially for 193 nm and 157 nm lithography with minimized deffects

Number of patents in Portfolio can not be more than 2000

United States of America Patent

10590059

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PATENT NO	7883578
APP PUB NO	20070277725A1
SERIAL NO	10590059
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
February 08, 2011	US,7883578,B2 US7883578B2	GRANTED PATENT AS SECOND PUBLICATION
December 06, 2007	US,20070277725,A1 US20070277725A1	FIRST PUBLISHED PATENT APPLICATION

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10590059

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