Scanning electron microscope and a method for pattern composite inspection using the same
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United States of America Patent
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Feb 8, 2011
Grant Date -
May 1, 2008
app pub date -
Oct 30, 2007
filing date -
Oct 31, 2006
priority date (Note) -
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Abstract
A scanning electron microscope capable of performing alone the critical dimension measurement and the defect inspection is provided. The scanning electron microscope has a reference image storage unit for storing a reference image transcribing a reference pattern, an inspected image pick-up unit for picking up, on the basis of the reference image, an inspected image transcribing an inspection pattern which pattern-matches with the reference pattern, a critical dimension measuring unit for measuring critical dimensions of the inspection pattern by using the inspected image, and a defect inspection unit for performing an inspection of a defect inside or outside the inspection pattern by comparing the reference image with the inspected image.
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