Plasma processing apparatus

United States of America Patent

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Feb 15, 2011
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Jun 29, 2006
app pub date
Dec 20, 2005
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Dec 23, 2004

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Abstract

A plasma processing apparatus for generating plasma in a chamber maintained in a vacuum state and processing a substrate using the plasma. The plasma processing apparatus includes a refrigerant channel for circulating a refrigerant formed in a shower head, thereby easily controlling the temperature of the shower head and improving the reproducibility of plasma treatment.

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Patent Owner	Address
ADVANCED DISPLAY PROCESS ENGINEERING CO LTD	GYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor Name	Address	# of filed Patents	Total Citations
Choi, Jun Young	Seoul, KR	103	402
Hwang, Young-Joo	Seoul, KR	3	36
Jo, Saeng Hyun	Daejeon, KR	9	108
Kim, Jong-Cheon	Pyeongtaek, KR	3	33
Lee, Young Jong	Sungnam-shi, KR	48	311

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Plasma processing apparatus

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United States of America Patent

11313022

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PATENT NO	7886687
APP PUB NO	20060137820A1
SERIAL NO	11313022
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
February 15, 2011	US,7886687,B2 US7886687B2	GRANTED PATENT AS SECOND PUBLICATION
June 29, 2006	US,20060137820,A1 US20060137820A1	FIRST PUBLISHED PATENT APPLICATION

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11313022

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