Cleaning liquid for semiconductor device and cleaning method
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United States of America Patent
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Feb 15, 2011
Grant Date -
Jun 24, 2010
app pub date -
Sep 16, 2009
filing date -
Mar 19, 2008
priority date (Note) -
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Abstract
The invention provides a cleaning liquid for semiconductor devices which is capable of removing deposits on a surface of an object to be cleaned including a photoresist, an antireflective film, an etching residue and an ashing residue at a low temperature in a short period of time with reduced environmental burdens and without causing corrosion of an interlayer dielectric film, a metal, a metal nitride, and an alloy in the object to be cleaned. The cleaning liquid for semiconductor devices according to the invention contains a reducing agent and a surfactant and has a pH of 10 to 14.
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