Limiting a portion of a patterning device used to pattern a beam
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United States of America Patent
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Feb 22, 2011
Grant Date -
Feb 5, 2009
app pub date -
May 27, 2008
filing date -
Jun 20, 2003
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Abstract
A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate is an integer multiple of a size of a pattern exposed on the substrate by the patterned beam.
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