Method for lateral implantation of spinous process spacer
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United States of America Patent
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Mar 8, 2011
Grant Date -
Nov 4, 2004
app pub date -
Mar 1, 2004
filing date -
Jan 2, 1997
priority date (Note) -
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status (Latency Note)
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Abstract
A spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant in an embodiment comprises a device positioned between spinous processes which provides a spinal extension stop and a spinal column flexion non-inhibitor thereby allowing freedom of spinal flexion. In an embodiment a distraction wedge can be used to distract the spinous processes. Methods for the preparation and implantation of a spine distraction device involve in an embodiment of the invention accessing the spinous processes, distracting and implanting the spinal distraction device between the spinous processes using a lateral insertion approach.
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