Low-energy method for fabrication of large-area sputtering targets
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United States of America Patent
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Mar 22, 2011
Grant Date -
Sep 11, 2008
app pub date -
Nov 5, 2007
filing date -
May 5, 2005
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Abstract
In various embodiments, large-area sputtering targets are formed by providing a plurality of sputtering targets each comprising a backing plate and a refractory metal layer disposed thereon, and spray depositing a refractory metal powder on an interface between the sputtering targets, the refractory metal powder consisting essentially of the same metal as each refractory metal layer, thereby joining the refractory metal layers of the sputtering targets.
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