Lithographic apparatus and device manufacturing method
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United States of America Patent
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Mar 22, 2011
Grant Date -
Aug 27, 2009
app pub date -
Mar 27, 2009
filing date -
Feb 18, 2004
priority date (Note) -
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Abstract
Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
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