Method and system for increasing throughput during location specific processing of a plurality of substrates
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United States of America Patent
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Mar 29, 2011
Grant Date -
Feb 5, 2009
app pub date -
Aug 1, 2007
filing date -
Aug 1, 2007
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Abstract
A method and system of location specific processing on a plurality of substrates is described. The method comprises measuring metrology data for the plurality of substrates. Thereafter, the method comprises computing correction data for a first substrate using the metrology data, followed by computing correction data for a second substrate using the metrology data. While computing the correction data for a second substrate, the method comprises applying the correction data for a first substrate to the first substrate using a gas cluster ion beam (GCIB).
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