Thermal analysis apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7922386
APP PUB NO 20080181281A1
SERIAL NO

11861332

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A thermal analysis apparatus includes: a sample temperature control device for surrounding a sample placed on a measurement position and controlling the temperature of the sample; a balance beam for supporting the sample and capable of tilting about a pivot point; and a sample moving device that allows the balance beam to slide between a first position at which the sample is situated at the measurement position and a second position at which the sample is situated at a distant position which is a position outside the sample temperature control unit. The distant position is a position which is deviated laterally from a line trajectory extending from the measurement position to the outside of the sample temperature control device. When the sample is at the measurement position, the balance beam is allowed to linearly slide and subsequently to rotationally slide about an axial line, to thereby transport the sample from the measurement position to the distant position.

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Patent Owner(s)

Patent OwnerAddress
RIGAKU CORPORATIONAKISHIMA-SHI TOKYO 196-8666

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Tanaka, Nobuhiro Koganei, JP 65 1056

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