Cluster tool architecture for processing a substrate

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7925377
APP PUB NO 20060286300A1
SERIAL NO

11458667

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment of the cluster tool, grouping substrates together, and transferring and processing the substrates in groups of two or more, improves system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
APPLIED MATERIALS, INC.SANTA CLARA, CA5552

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Armer, Helen R Cupertino, US 21 375
Backer, John A San Jose, US 11 176
Carlson, Charles Cedar Park, US 28 439
Herchen, Harald Los Altos, US 92 1027
Hudgens, Jeffrey San Francisco, US 21 312
Ishikawa, Tetsuya Saratogo, US 269 4511
Lowrance, Robert Los Gatos, US 24 431
Lue, Brian Mountain View, US 30 815
Pinson, Jay D San Jose, US 19 286
Quach, David H San Jose, US 37 366
Rice, Michael Pleasanton, US 77 2043
Roberts, Rick J San Jose, US 25 622
Salek, Mohsen S Saratoga, US 16 185
Volfovski, Leon Mountain View, US 35 318
Wang, Chongyang San Jose, US 26 376
Weaver, William Tyler Austin, US 25 360

Cited Art Landscape

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6676757 Coating film forming apparatus and coating unit 24 2000
6695922 Film forming unit 16 2000
6514344 Film forming unit 12 2000
6605153 Coating film forming apparatus 16 2000
6616760 Film forming unit 16 2000
6384894 Developing method and developing unit 22 2001
6287390 Apparatus and method of cleaning nozzle and apparatus of processing substrate 14 2001
6450803 Heat treatment apparatus 18 2001
6340643 Treatment solution supply method 22 2001
6620251 Substrate processing method and substrate processing apparatus 15 2001
6551448 Heat processing apparatus of substrate 13 2001
6634806 Substrate processing method and substrate processing apparatus 22 2001
6503003 Film forming method and film forming apparatus 13 2001
6551400 Coating apparatus 15 2001
6578772 Treatment solution supply apparatus and treatment solution supply method 17 2001
6633022 Substrate processing apparatus and substrate processing method 15 2001
6617095 Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern 17 2001
6541376 Film forming method and film forming apparatus 14 2001
6491452 Developing method and developing apparatus 12 2001
6474986 Hot plate cooling method and heat processing apparatus 41 2001
6402399 Developing method and developing apparatus 13 2001
6496245 Developing method and developing apparatus 15 2001
6589339 Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film 16 2001
6471421 Developing unit and developing method 13 2001
6518199 Method and system for coating and developing 14 2001
6579370 Apparatus and method for coating treatment 12 2001
6526329 Substrate processing system and substrate processing method 29 2001
6706321 Developing treatment method and developing treatment unit 12 2001
6443641 Substrate process method and substrate process apparatus 20 2001
6507770 Substrate processing system and substrate processing method 24 2001
6541170 Resist processing method controlled through reflectivity data 16 2001
6620245 Liquid coating apparatus with temperature controlling manifold 11 2001
6821550 Apparatus and method for applying process solution 12 2001
6527861 Developing apparatus with a porous film nozzle 16 2001
6568847 Judging method and processing apparatus 16 2001
6380518 Heat treatment apparatus and substrate processing system 22 2001
6837631 Substrate processing method and substrate processing apparatus 13 2001
6726771 Treatment solution supply method and treatment solution supply unit 16 2001
6616762 Treatment solution supply apparatus and treatment solution supply method 20 2001
6752872 Coating unit and coating method 22 2001
6485782 Coating film forming method and coating apparatus 17 2001
6715943 Solution treatment method and solution treatment unit 25 2001
6501191 Heat treatment apparatus and method 16 2001
6814809 Coating and developing apparatus and pattern forming method 13 2001
6834210 Substrate processing system and substrate processing method 16 2001
6573031 Apparatus and method of thermal processing and method of pattern formation 15 2001
6744020 Heat processing apparatus 13 2001
6644965 Substrate processing apparatus and substrate processing method 24 2002
6659661 Substrate processing apparatus 16 2002
6716478 Coating film forming apparatus and coating film forming method 12 2002
6860945 Substrate coating unit and substrate coating method 11 2002
6713239 Developing method and developing apparatus 13 2002
6843259 Solution treatment unit 12 2002
6824616 Substrate processing method and substrate processing system 14 2002
6471422 Substrate processing apparatus and substrate processing method 35 2002
6773510 Substrate processing unit 12 2002
6884294 Coating film forming method and apparatus 13 2002
6620244 Resist film forming method and resist coating apparatus 12 2002
6852194 Processing apparatus, transferring apparatus and transferring method 45 2002
6627263 Film forming apparatus and film forming method 53 2002
6753508 Heating apparatus and heating method 27 2002
6869640 Coating film forming method and coating film forming apparatus 13 2002
6683006 Film forming method and film forming apparatus 14 2002
6713120 Substrate processing system and substrate processing method 12 2002
6841342 Substrate processing apparatus and substrate processing method 16 2002
6808566 Reduced-pressure drying unit and coating film forming method 15 2002
6811962 Method for developing processing and apparatus for supplying developing solution 17 2002
6878216 Substrate processing method and substrate processing system 11 2002
6686571 Heat treatment unit, cooling unit and cooling treatment method 12 2002
6761125 Coating film forming system 12 2002
6672779 Substrate processing apparatus and substrate processing method 23 2002
6878401 Substrate processing method 16 2002
6809036 Dry silylation plasma etch process 11 2002
6709174 Apparatus and method for development 16 2002
6790283 Coating apparatus 13 2002
6811613 Coating film forming apparatus 12 2002
6736556 Substrate processing apparatus 17 2002
6730599 Film forming method and film forming apparatus 14 2003
6673151 Substrate processing apparatus 14 2003
6815647 Heat treatment unit and heat treatment method 14 2003
7279067 Port structure in semiconductor processing system 23 2003
6796054 Low-pressure dryer and low-pressure drying method 21 2003
6780795 Heat treatment apparatus for preventing an initial temperature drop when consecutively processing a plurality of objects 11 2003
6848625 Process liquid supply mechanism and process liquid supply method 17 2003
6872256 Film forming unit 13 2003
6817790 Substrate processing method and substrate processing apparatus 17 2003
6830774 Coating method 12 2004
 
ASML HOLDING N.V. (8)
5670210 Method of uniformly coating a substrate 54 1995
6177133 Method and apparatus for adaptive process control of critical dimensions during spin coating process 20 1997
6533531 Device for handling wafers in microelectronic manufacturing 16 1998
6418356 Method and apparatus for resolving conflicts in a substrate processing system 28 1999
6678572 Recipe cascading in a wafer processing system 30 2000
6662466 Method for two dimensional adaptive process control of critical dimensions during spin coating process 16 2001
6770424 Wafer track apparatus and methods for dispensing fluids with rotatable dispense arms 25 2002
6768930 Method and apparatus for resolving conflicts in a substrate processing system 19 2003
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
TEL NEXX, INC. (2)
8967935 Substrate loader and unloader 0 2011
9421617 Substrate holder 1 2012
 
NOVELLUS SYSTEMS, INC. (5)
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SOKUDO CO., LTD. (3)
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APPLIED MATERIALS, INC. (4)
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Chen Long Technology Corp. Ltd. (2)
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SEMES CO., LTD. (2)
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TOKYO ELECTRON LIMITED (3)
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SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD. (10)
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9299596 Substrate treating apparatus with parallel substrate treatment lines simultaneously treating a plurality of substrates 0 2008
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9230834 Substrate treating apparatus 0 2012
9174235 Substrate treating apparatus using horizontal treatment cell arrangements with parallel treatment lines 0 2012
9165807 Substrate treating apparatus with vertical treatment arrangement including vertical blowout and exhaust units 2 2012
8708587 Substrate treating apparatus with inter-unit buffers 7 2013
9368383 Substrate treating apparatus with substrate reordering 0 2014
* Cited By Examiner

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