US Patent No: 7,925,377

Number of patents in Portfolio can not be more than 2000

Cluster tool architecture for processing a substrate

ALSO PUBLISHED AS: 20060286300
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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment of the cluster tool, grouping substrates together, and transferring and processing the substrates in groups of two or more, improves system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
APPLIED MATERIALS, INC.SANTA CLARA, CA5301

International Classification(s)

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  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Armer, Helen R Cupertino, CA 36 216
Backer, John A San Jose, CA 19 120
Carlson, Charles Cedar Park, TX 43 293
Herchen, Harald Los Altos, CA 113 695
Hudgens, Jeffrey San Francisco, CA 35 196
Ishikawa, Tetsuya Santa Clara, CA 355 3146
Lowrance, Robert Los Gatos, CA 35 302
Lue, Brian Mountain View, CA 36 582
Pinson, Jay D San Jose, CA 28 217
Quach, David H San Jose, CA 56 239
Rice, Michael Pleasanton, CA 97 1360
Roberts, Rick J San Jose, CA 41 379
Salek, Mohsen S Saratoga, CA 24 121
Volfovski, Leon Mountain View, CA 43 246
Wang, Chongyang San Jose, CA 37 258
Weaver, William Tyler Austin, TX 42 237

Cited Art Landscape

Patent Info (Count) # Cites Year
 
TOKYO ELECTRON LIMITED (271)
4,855,775 Developing apparatus 17 1988
4,982,694 Automatic coating system 31 1989
4,899,686 Coating device 31 1989
5,002,008 Coating apparatus and method for applying a liquid to a semiconductor wafer, including selecting a nozzle in a stand-by state 59 1989
5,061,144 Resist process apparatus 125 1989
5,070,813 Coating apparatus 27 1990
5,127,362 Liquid coating device 93 1990
5,151,871 Method for heat-processing semiconductor device and apparatus for the same 39 1990
5,035,200 Processing liquid supply unit 34 1990
5,089,305 Coating apparatus and method for applying a liquid to a semiconductor wafer including selecting a nozzle on a stand by state 39 1990
5,250,114 Coating apparatus with nozzle moving means 36 1991
5,254,367 Coating method and apparatus 24 1992
5,240,556 Surface-heating apparatus and surface-treating method 41 1992
5,275,658 Liquid supply apparatus 27 1992
5,339,128 Resist processing method 50 1993
5,416,047 Method for applying process solution to substrates 24 1993
5,401,316 Method and apparatus for hydrophobic treatment 84 1993
5,580,607 Coating apparatus and method 59 1994
5,505,781 Hydrophobic processing apparatus including a liquid delivery system 33 1994
5,658,615 Method of forming coating film and apparatus therefor 114 1994
5,536,918 Heat treatment apparatus utilizing flat heating elements for treating semiconductor wafers 80 1994
5,633,040 Method and apparatus for treating film coated on substrate 17 1994
5,514,852 Heat treatment device 18 1994
5,608,943 Apparatus for removing process liquid 116 1994
5,501,870 Method and apparatus for hydrophobic treatment 25 1995
5,626,913 Resist processing method and apparatus 49 1995
5,803,932 Resist processing apparatus having an interface section including two stacked substrate waiting tables 35 1995
5,695,817 Method of forming a coating film 55 1995
5,689,749 Apparatus for developing a resist-coated substrate 39 1995
5,665,200 Substrate processing method and substrate processing apparatus 25 1995
5,762,708 Coating apparatus therefor 70 1995
5,762,745 Substrate processing apparatus 39 1995
5,672,205 Coating apparatus 29 1995
5,625,433 Apparatus and method for developing resist coated on a substrate 44 1995
5,620,560 Method and apparatus for heat-treating substrate 38 1995
5,817,156 Substrate heat treatment table apparatus 28 1995
6,033,475 Resist processing apparatus 33 1995
5,941,083 Cooling device and cooling method 30 1996
5,681,614 Hydrophobic treatment method involving delivery of a liquid process agent to a process space 20 1996
5,711,809 Coating apparatus and method of controlling the same 23 1996
5,834,737 Heat treating apparatus 32 1996
5,688,322 Apparatus for coating resist on substrate 55 1996
5,942,035 Solvent and resist spin coating apparatus 67 1996
5,772,764 Coating apparatus 48 1996
5,803,970 Method of forming a coating film and coating apparatus 42 1996
5,989,346 Semiconductor processing apparatus 75 1996
5,779,796 Resist processing method and apparatus 63 1996
6,228,561 Film forming method and film forming apparatus 20 1997
5,932,380 Method of processing resist utilizing alkaline component monitoring 21 1997
5,906,860 Apparatus for treating a substrate with resist and resist-treating method 24 1997
5,854,953 Method for developing treatment 36 1997
5,939,130 Coating film forming method and coating film forming apparatus 46 1997
5,826,130 Apparatus and method for developing resist coated on substrate 21 1997
5,853,812 Method and apparatus for processing substrates 17 1997
5,845,170 Developing method 24 1997
6,010,570 Apparatus for forming coating film for semiconductor processing 25 1997
5,912,054 Coating method and apparatus 18 1997
5,938,847 Method and apparatus for coating a film on an object being processed 29 1997
5,919,520 Coating method and apparatus for semiconductor process 60 1997
5,974,682 Cooling process system 56 1997
5,972,110 Resist processing system 35 1997
5,866,307 Resist processing method and resist processing system 16 1997
5,871,584 Processing apparatus and processing method 60 1997
5,965,200 Processing apparatus and processing method 32 1997
5,908,657 Coating apparatus and method of controlling the same 18 1997
5,923,915 Method and apparatus for processing resist 22 1997
5,976,256 Film coating apparatus 35 1997
5,960,225 Substrate treatment apparatus 31 1997
6,015,066 Liquid supplying device 13 1997
5,945,161 Apparatus and method for supplying process solution to surface of substrate to be processed 42 1997
6,190,063 Developing method and apparatus 25 1998
6,002,108 Baking apparatus and baking method 38 1998
5,968,691 Method and apparatus for coating resist and developing the coated resist 66 1998
6,126,725 Deaerating apparatus and treatment apparatus with gas permeable films 18 1998
5,943,880 Cooling apparatus, cooling method, and processing apparatus 25 1998
5,993,518 Deaerating apparatus, deaerating method, and treatment apparatus 24 1998
6,056,998 Coating apparatus and coating method 38 1998
6,004,047 Method of and apparatus for processing photoresist, method of evaluating photoresist film, and processing apparatus using the evaluation method 87 1998
6,062,240 Treatment device 25 1998
5,970,717 Cooling method, cooling apparatus and treatment apparatus 30 1998
6,013,317 Coating apparatus and method therefor 19 1998
6,117,486 Photoresist coating method and apparatus 36 1998
6,062,288 Processing apparatus 31 1998
6,227,786 Substrate treating apparatus 16 1998
6,207,231 Coating film forming method and coating apparatus 21 1998
6,143,478 Resist processing method 13 1998
6,063,439 Processing apparatus and method using solution 25 1998
6,053,977 Coating apparatus 16 1998
6,284,043 Solution treatment apparatus 26 1998
6,104,002 Heat treating apparatus 23 1998
6,113,695 Coating unit 22 1998
6,012,858 Apparatus and method for forming liquid film 35 1998
6,147,329 Resist processing system and resist processing method 18 1998
6,306,455 Substrate processing method 30 1998
6,203,969 Resist processing apparatus which measures temperature of heat-sensing substrate and measuring method therein 17 1998
6,217,657 Resist processing system having process solution deaeration mechanism 12 1998
6,159,541 Spin coating process 21 1998
6,168,665 Substrate processing apparatus 15 1998
6,300,043 Method of forming resist film 15 1998
6,222,161 Heat treatment apparatus 37 1999
6,087,632 Heat processing device with hot plate and associated reflector 39 1999
6,391,111 Coating apparatus 23 1999
6,156,125 Adhesion apparatus 15 1999
6,228,171 Heat processing apparatus 26 1999
6,229,116 Heat treatment apparatus 29 1999
6,257,778 Method for developing front surface of substrate with improved developing function of developing solution and apparatus thereof 11 1999
6,291,800 Heat treatment apparatus and substrate processing system 38 1999
6,169,274 Heat treatment apparatus and method, detecting temperatures at plural positions each different in depth in holding plate, and estimating temperature of surface of plate corresponding to detected result 31 1999
6,419,408 Developing process and developing unit 22 1999
6,202,653 Processing solution supplying apparatus, processing apparatus and processing method 13 1999
6,368,776 Treatment apparatus and treatment method 19 1999
6,749,688 Coating method and apparatus for semiconductor process 24 1999
6,261,365 Heat treatment method, heat treatment apparatus and treatment system 16 1999
6,017,663 Method of processing resist utilizing alkaline component monitoring 12 1999
6,063,190 Method of forming coating film and apparatus therefor 53 1999
6,221,787 Apparatus and method of forming resist film 27 1999
6,268,013 Coating a resist film, with pretesting for particle contamination 18 1999
6,183,147 Process solution supply system, substrate processing apparatus employing the system, and intermediate storage mechanism employed in the system 14 1999
6,241,403 Developing method and developing apparatus 19 1999
6,281,145 Apparatus and method for applying process solution 24 1999
6,318,948 Substrate transfer apparatus and substrate processing apparatus 19 1999
6,210,481 Apparatus and method of cleaning nozzle and apparatus of processing substrate 23 1999
6,635,113 Coating apparatus and coating method 17 1999
6,191,394 Heat treating apparatus 33 1999
6,266,125 Resist processing method and apparatus 30 1999
6,193,783 Apparatus and method for supplying a process solution 26 1999
6,416,583 Film forming apparatus and film forming method 66 1999
6,258,167 Process liquid film forming apparatus 18 1999
6,129,546 Heat process apparatus and heat process method 36 1999
6,444,029 Multistage spin type substrate processing system 22 1999
6,246,030 Heat processing method and apparatus 24 1999
6,216,475 Cooling device and cooling method 15 1999
6,261,007 Substrate process method and substrate process apparatus 29 1999
6,361,600 Film forming apparatus and film forming method 15 1999
6,451,515 Substrate treating method 19 1999
6,292,250 Substrate process apparatus 18 1999
6,261,744 Baking apparatus and baking method 15 1999
6,097,005 Substrate processing apparatus and substrate processing method 49 1999
6,238,107 Developing apparatus 18 1999
6,051,349 Apparatus for coating resist and developing the coated resist 36 1999
6,402,844 Substrate processing method and substrate processing unit 18 1999
6,185,370 Heating apparatus for heating an object to be processed 19 1999
6,299,938 Apparatus and method of applying resist 14 1999
6,313,903 Resist coating and developing unit 39 2000
6,410,194 Resist film forming method and resist coating apparatus 13 2000
6,654,668 Processing apparatus, processing system, distinguishing method, and detecting method 16 2000
6,398,429 Developing method and developing apparatus 12 2000
6,238,848 Developing method and developing apparatus 12 2000
6,371,667 Film forming method and film forming apparatus 33 2000
6,319,317 Coating film forming method and coating apparatus 32 2000
6,432,199 Apparatus and method for processing a substrate 19 2000
6,267,516 Developing apparatus and developing nozzle 23 2000
6,382,849 Developing method and developing apparatus 17 2000
6,464,789 Substrate processing apparatus 26 2000
6,656,281 Substrate processing apparatus and substrate processing method 13 2000
6,293,713 Substrate processing apparatus 20 2000
6,238,109 Processing solution supply apparatus 18 2000
6,475,279 Substrate processing apparatus and substrate processing method 14 2000
6,241,402 Developing apparatus and method thereof 13 2000
6,332,723 Substrate processing apparatus and method 24 2000
6,450,805 Hot plate cooling method and heat processing apparatus 18 2000
6,533,864 Solution processing apparatus and method 26 2000
6,485,893 Resist pattern forming method and film forming method 12 2000
6,458,208 Film forming apparatus 17 2000
6,536,964 Substrate processing system and substrate processing method 13 2000
6,402,509 Substrate processing apparatus and substrate processing method 29 2000
6,379,056 Substrate processing apparatus 18 2000
6,514,073 Resist processing method and resist processing apparatus 24 2000
6,514,343 Coating apparatus 14 2000
6,447,608 Spin coating apparatus 18 2000
6,534,750 Heat treatment unit and heat treatment method 15 2000
6,402,400 Substrate processing apparatus 32 2000
6,514,570 Solution processing apparatus and method 37 2000
6,527,860 Substrate processing apparatus 22 2000
6,364,547 Solution processing apparatus 21 2000
6,431,769 Substrate processing system and substrate processing method 16 2000
6,602,382 Solution processing apparatus 21 2000
6,851,872 Substrate processing apparatus and substrate processing method 18 2000
6,537,373 Method of forming film and apparatus thereof 18 2000
6,599,366 Substrate processing unit and processing method 19 2000
6,461,438 Heat treatment unit, cooling unit and cooling treatment method 15 2000
6,709,523 Silylation treatment unit and method 23 2000
6,402,508 Heat and cooling treatment apparatus and substrate processing system 16 2000
6,383,948 Coating film forming apparatus and coating film forming method 21 2000
6,676,757 Coating film forming apparatus and coating unit 24 2000
6,695,922 Film forming unit 15 2000
6,514,344 Film forming unit 11 2000
6,605,153 Coating film forming apparatus 16 2000
6,616,760 Film forming unit 16 2000
6,384,894 Developing method and developing unit 21 2001
6,287,390 Apparatus and method of cleaning nozzle and apparatus of processing substrate 14 2001
6,450,803 Heat treatment apparatus 15 2001
6,340,643 Treatment solution supply method 22 2001
6,620,251 Substrate processing method and substrate processing apparatus 14 2001
6,551,448 Heat processing apparatus of substrate 12 2001
6,634,806 Substrate processing method and substrate processing apparatus 20 2001
6,503,003 Film forming method and film forming apparatus 13 2001
6,551,400 Coating apparatus 15 2001
6,578,772 Treatment solution supply apparatus and treatment solution supply method 16 2001
6,633,022 Substrate processing apparatus and substrate processing method 15 2001
6,617,095 Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern 16 2001
6,541,376 Film forming method and film forming apparatus 14 2001
6,491,452 Developing method and developing apparatus 12 2001
6,474,986 Hot plate cooling method and heat processing apparatus 37 2001
6,402,399 Developing method and developing apparatus 11 2001
6,496,245 Developing method and developing apparatus 15 2001
6,589,339 Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film 15 2001
6,471,421 Developing unit and developing method 13 2001
6,518,199 Method and system for coating and developing 14 2001
6,579,370 Apparatus and method for coating treatment 12 2001
6,526,329 Substrate processing system and substrate processing method 29 2001
6,706,321 Developing treatment method and developing treatment unit 11 2001
6,443,641 Substrate process method and substrate process apparatus 20 2001
6,507,770 Substrate processing system and substrate processing method 24 2001
6,541,170 Resist processing method controlled through reflectivity data 16 2001
6,620,245 Liquid coating apparatus with temperature controlling manifold 11 2001
6,821,550 Apparatus and method for applying process solution 12 2001
6,527,861 Developing apparatus with a porous film nozzle 15 2001
6,568,847 Judging method and processing apparatus 16 2001
6,380,518 Heat treatment apparatus and substrate processing system 22 2001
6,837,631 Substrate processing method and substrate processing apparatus 13 2001
6,726,771 Treatment solution supply method and treatment solution supply unit 16 2001
6,616,762 Treatment solution supply apparatus and treatment solution supply method 20 2001
6,752,872 Coating unit and coating method 16 2001
6,485,782 Coating film forming method and coating apparatus 17 2001
6,715,943 Solution treatment method and solution treatment unit 24 2001
6,501,191 Heat treatment apparatus and method 15 2001
6,814,809 Coating and developing apparatus and pattern forming method 13 2001
6,834,210 Substrate processing system and substrate processing method 15 2001
6,573,031 Apparatus and method of thermal processing and method of pattern formation 15 2001
6,744,020 Heat processing apparatus 12 2001
6,644,965 Substrate processing apparatus and substrate processing method 24 2002
6,659,661 Substrate processing apparatus 16 2002
6,716,478 Coating film forming apparatus and coating film forming method 12 2002
6,860,945 Substrate coating unit and substrate coating method 11 2002
6,713,239 Developing method and developing apparatus 13 2002
6,843,259 Solution treatment unit 12 2002
6,824,616 Substrate processing method and substrate processing system 14 2002
6,471,422 Substrate processing apparatus and substrate processing method 33 2002
6,773,510 Substrate processing unit 12 2002
6,884,294 Coating film forming method and apparatus 13 2002
6,620,244 Resist film forming method and resist coating apparatus 12 2002
6,852,194 Processing apparatus, transferring apparatus and transferring method 38 2002
6,627,263 Film forming apparatus and film forming method 53 2002
6,753,508 Heating apparatus and heating method 22 2002
6,869,640 Coating film forming method and coating film forming apparatus 12 2002
6,683,006 Film forming method and film forming apparatus 14 2002
6,713,120 Substrate processing system and substrate processing method 12 2002
6,841,342 Substrate processing apparatus and substrate processing method 15 2002
6,808,566 Reduced-pressure drying unit and coating film forming method 15 2002
6,811,962 Method for developing processing and apparatus for supplying developing solution 17 2002
6,878,216 Substrate processing method and substrate processing system 11 2002
6,686,571 Heat treatment unit, cooling unit and cooling treatment method 11 2002
6,761,125 Coating film forming system 11 2002
6,672,779 Substrate processing apparatus and substrate processing method 21 2002
6,878,401 Substrate processing method 15 2002
6,809,036 Dry silylation plasma etch process 11 2002
6,709,174 Apparatus and method for development 15 2002
6,790,283 Coating apparatus 11 2002
6,811,613 Coating film forming apparatus 12 2002
6,736,556 Substrate processing apparatus 17 2002
6,730,599 Film forming method and film forming apparatus 14 2003
6,673,151 Substrate processing apparatus 14 2003
6,815,647 Heat treatment unit and heat treatment method 14 2003
7,279,067 Port structure in semiconductor processing system 17 2003
6,796,054 Low-pressure dryer and low-pressure drying method 20 2003
6,780,795 Heat treatment apparatus for preventing an initial temperature drop when consecutively processing a plurality of objects 11 2003
6,848,625 Process liquid supply mechanism and process liquid supply method 17 2003
6,872,256 Film forming unit 13 2003
6,817,790 Substrate processing method and substrate processing apparatus 17 2003
6,830,774 Coating method 12 2004
 
DAINIPPON SCREEN MFG. CO., LTD. (158)
4,634,655 Method of forming corrosion resistant film on the surface of substrate composed of copper or copper alloy 12 1985
4,750,505 Apparatus for processing wafers and the like 73 1986
4,830,888 Surface treatment method and apparatus thereof 16 1986
4,756,047 Apparatus for removing organic substance from substrate 26 1986
4,803,734 Method of and apparatus for detecting pattern defects 35 1986
4,755,257 Method of processing thin metal sheets by photoetching 22 1987
4,871,417 Method and apparatus for surface treating of substrates 109 1987
4,788,994 Wafer holding mechanism 116 1987
4,838,979 Apparatus for processing substrate surface 56 1987
4,774,552 Apparatus for and method of positioning and holding photosensitive material 14 1987
4,846,623 Wafer transferring device 26 1987
4,856,641 Apparatus and a method for carrying wafers 26 1987
4,922,278 Developing apparatus 12 1988
4,870,923 Apparatus for treating the surfaces of wafers 86 1988
4,857,949 Device for venting fumes given off by automatic developing equipment 13 1988
4,985,720 Method of controlling temperature for drying photosensitive material 15 1988
4,892,761 Surface treatment method and apparatus therefor 17 1988
4,895,604 Method and apparatus for rinsing materials or articles 14 1988
4,923,054 Wafer transfer apparatus having an improved wafer transfer portion 58 1988
4,924,800 Apparatus for applying photo-resist to substrate 31 1989
4,924,073 Method of controlling heat treatment apparatus for substrate 57 1989
4,919,073 Surface treatment method and apparatus thereof 16 1989
5,032,217 System for treating a surface of a rotating wafer 89 1989
4,966,094 Surface treatment method and apparatus therefor 18 1989
4,987,687 Rotary wafer drier 27 1989
4,998,021 Method of detecting an end point of surface treatment 53 1989
5,174,855 Surface treating apparatus and method using vapor 39 1990
5,078,832 Method of treating wafer surface 68 1990
5,180,431 Apparatus for applying liquid agent on surface of rotating substrate 54 1990
5,020,200 Apparatus for treating a wafer surface 64 1990
5,065,178 Photosensitive material detecting apparatus 13 1990
5,234,499 Spin coating apparatus 40 1991
5,201,653 Substrate heat-treating apparatus 17 1991
5,307,109 Method and apparatus for processing photosensitive material 19 1991
5,349,412 Method and apparatus for processing photosensitive material 21 1991
5,209,180 Spin coating apparatus with an upper spin plate cleaning nozzle 56 1992
5,322,079 Substrate holding apparatus of a simple structure for holding a rotating substrate, and a substrate processing apparatus including the substrate holding apparatus 28 1992
5,331,987 Apparatus and method for rinsing and drying substrate 46 1992
5,359,785 Substrate transport apparatus 19 1992
5,438,209 Apparatus for detecting position of a notch in a semiconductor wafer 36 1993
5,436,848 Method of and device for transporting semiconductor substrate in semiconductor processing system 78 1993
5,308,210 Interface apparatus for transporting substrates between substrate processing apparatus 18 1993
5,430,271 Method of heat treating a substrate with standby and treatment time periods 49 1993
5,411,076 Substrate cooling device and substrate heat-treating apparatus 58 1994
5,485,644 Substrate treating apparatus 65 1994
5,376,216 Device for holding and rotating a substrate 27 1994
5,514,215 Treating liquid supplying apparatus for a substrate spin treating apparatus 15 1994
5,520,744 Device for rinsing and drying substrate 134 1994
5,674,410 Chemical agent producing device and method thereof 38 1994
5,599,394 Apparatus for delivering a silica film forming solution 43 1994
5,522,215 Substrate cooling apparatus 24 1994
5,601,645 Substrate holder for a substrate spin treating apparatus 38 1994
5,555,234 Developing method and apparatus 28 1995
5,618,348 Air elimination system 12 1995
5,668,733 Substrate processing apparatus and method 31 1995
* 5,687,085 Substrate processing apparatus and method 23 1995
5,611,685 Substrate heat treatment apparatus 14 1995
5,639,301 Processing apparatus having parts for thermal and non-thermal treatment of substrates 33 1995
5,688,324 Apparatus for coating substrate 15 1995
5,571,325 Subtrate processing apparatus and device for and method of exchanging substrate in substrate processing apparatus 133 1995
5,715,173 Concentration controlling method and a substate treating apparatus utilizing same 34 1995
5,688,326 Apparatus for coating elongated material with photoresist 12 1995
5,638,687 Substrate cooling method and apparatus 20 1995
5,704,493 Substrate holder 31 1995
5,919,529 Apparatus for and method of processing substrate 25 1996
5,823,736 Substrate processing device and method for substrate from the substrate processing device 38 1996
5,853,483 Substrate spin treating method and apparatus 13 1996
5,763,892 Ultraviolet irradiator for substrate, substrate treatment system, and method of irradiating substrate with ultraviolet light 24 1996
5,841,515 Substrate container cassette, interface mechanism, and substrate processing 17 1996
5,677,000 Substrate spin treating method and apparatus 34 1996
5,788,868 Substrate transfer method and interface apparatus 38 1996
5,904,169 Apparatus for and method of treating substrate 12 1996
5,701,627 Substrate processing apparatus 32 1996
5,730,574 Transfer apparatus for and method of transferring substrate 26 1996
6,000,862 Substrate developing method and apparatus 17 1996
5,788,773 Substrate spin treating method and apparatus 23 1996
5,898,588 Method and apparatus for controlling substrate processing apparatus 21 1996
5,906,469 Apparatus and method for detecting and conveying substrates in cassette 44 1996
5,792,259 Substrate processing apparatus and air supply method in substrate processing apparatus 13 1996
5,867,389 Substrate processing management system with recipe copying functions 64 1996
5,762,684 Treating liquid supplying method and apparatus 52 1996
6,021,790 Substrate treating apparatus and method for treating substrate 17 1996
5,788,742 Method and apparatus for degassing processing solution for substrates 24 1996
5,888,344 Method of and an apparatus for processing a substrate 14 1996
6,007,629 Substrate processing apparatus 13 1996
5,989,342 Apparatus for substrate holding 81 1997
5,765,072 Treating solution supplying method and substrate treating apparatus 22 1997
6,120,834 Apparatus for forming film and method for forming film 20 1997
5,846,327 Substrate spin treating apparatus 14 1997
5,927,077 Processing system hot plate construction substrate 37 1997
5,881,750 Substrate treating apparatus 15 1997
5,875,804 Substrate treating apparatus 17 1997
5,915,396 Substrate processing apparatus 20 1997
6,048,400 Substrate processing apparatus 15 1997
6,053,058 Atmosphere concentration monitoring for substrate processing apparatus and life determination for atmosphere processing unit of substrate processing apparatus 13 1997
5,916,366 Substrate spin treating apparatus 72 1997
5,943,726 Substrate processing apparatus 23 1997
6,067,727 Apparatus and method for drying substrates 30 1997
6,077,321 Wet/dry substrate processing apparatus 45 1997
6,099,643 Apparatus for processing a substrate providing an efficient arrangement and atmospheric isolation of chemical treatment section 29 1997
5,927,303 Substrate processing apparatus 39 1997
* 5,963,753 Substrate processing apparatus 52 1998
5,985,357 Treating solution supplying method and apparatus 39 1998
6,040,120 Thermal processing apparatus 18 1998
6,060,697 Substrate processing apparatus having regulated power consumption and method therefor 24 1998
6,051,101 Substrate processing apparatus, substrate transport apparatus and substrate transfer apparatus 71 1998
6,074,515 Apparatus for processing substrates 22 1998
6,012,192 Substrate processing apparatus 42 1998
6,062,852 Substrate heat-treating apparatus 27 1998
6,089,762 Developing apparatus, developing method and substrate processing apparatus 18 1998
6,446,646 Substrate processing apparatus 15 1998
6,076,979 Method of and apparatus for supplying developing solution onto substrate 23 1998
6,159,291 Substrate treating apparatus 19 1998
6,371,713 Substrate processing apparatus 22 1998
5,962,070 Substrate treating method and apparatus 38 1998
6,155,275 Substrate processing unit and substrate processing apparatus using the same 25 1998
6,253,118 Substrate transport method and apparatus 30 1998
6,174,371 Substrate treating method and apparatus 19 1998
6,571,147 System for and method of managing jobs 19 1998
6,149,727 Substrate processing apparatus 22 1998
6,260,562 Substrate cleaning apparatus and method 44 1998
6,199,568 Treating tank, and substrate treating apparatus having the treating tank 14 1998
6,138,695 Substrate processing apparatus 15 1998
6,352,083 Substrate treating apparatus and substrate treating method 12 1998
6,354,311 Substrate drying apparatus and substrate processing apparatus 18 2000
6,465,765 Fluid heating apparatus 26 2001
6,401,353 Substrate dryer 15 2001
6,790,287 Substrate processing apparatus, substrate inspection method and substrate processing system 19 2001
6,790,291 Method of and apparatus for processing substrate 19 2001
6,805,769 Substrate processing apparatus 14 2001
6,550,988 Substrate processing apparatus 36 2001
6,790,286 Substrate processing apparatus 16 2002
6,511,315 Substrate processing apparatus 22 2002
6,692,165 Substrate processing apparatus 17 2002
6,896,466 Substrate processing apparatus 16 2002
6,669,808 Substrate processing apparatus and substrate processing method 17 2002
6,712,579 Substrate transfer apparatus and substrate transfer method 16 2002
6,558,053 Substrate processing apparatus 26 2002
6,889,105 Scheduling method and program for a substrate processing apparatus 18 2002
6,775,456 Conductor connecting apparatus 17 2002
6,826,214 Device supporting apparatus 12 2002
6,598,805 Substrate cleaning apparatus 20 2002
* 6,841,031 Substrate processing apparatus equipping with high-pressure processing unit 14 2002
6,807,452 Scheduling method and program for a substrate processing apparatus 15 2002
6,893,805 Substrate processing apparatus and substrate processing method 13 2002
6,656,277 Apparatus for and method of processing substrate 13 2002
6,793,769 Substrate processing apparatus 22 2002
6,749,351 Apparatus for developing substrate 11 2002
6,878,303 Substrate processing apparatus and substrate processing method 15 2003
6,827,782 Chemical treating apparatus 15 2003
6,691,430 High-pressure drying apparatus, high-pressure drying method and substrate processing apparatus 15 2003
6,868,888 Thin film forming apparatus, film supplier, film cassette, transport mechanism and transport method 15 2003
6,814,507 Substrate treating apparatus 23 2003
6,893,171 Substrate treating apparatus 44 2003
6,752,543 Substrate processing apparatus 17 2003
6,832,863 Substrate treating apparatus and method 19 2003
6,807,455 System for and method of processing substrate 14 2003
6,837,632 Substrate treating apparatus 15 2003
 
APPLIED MATERIALS, INC. (23)
6,176,667 Multideck wafer processing system 51 1996
6,248,398 Coater having a controllable pressurized process chamber for semiconductor processing 44 1996
5,838,121 Dual blade robot 61 1996
5,961,269 Three chamber load lock apparatus 37 1996
5,921,257 Device for treating substrates in a fluid container 20 1996
6,018,616 Thermal cycling module and process using radiant heat 80 1998
6,359,264 Thermal cycling module 19 1998
5,992,431 Device for treating substrates in a fluid container 22 1998
6,336,204 Method and apparatus for handling deadlocks in multiple chamber cluster tools 38 1998
6,539,956 Method and device for drying substrates 20 1998
6,302,960 Photoresist coater 15 1998
6,454,332 Apparatus and methods for handling a substrate 24 1998
6,128,829 Method for drying substrates 19 1999
6,283,701 Pneumatically actuated flexure gripper for wafer handling robots 31 1999
6,108,932 Method and apparatus for thermocapillary drying 52 1999
6,318,951 Robots for microelectronic workpiece handling 78 1999
6,278,089 Heater for use in substrate processing 43 1999
6,313,441 Control system and method for providing variable ramp rate operation of a thermal cycling system 19 1999
6,224,638 Method and apparatus for scheduling wafer processing within a multiple chamber semiconductor wafer processing tool having a multiple blade robot 79 2000
2002/0098,072 Dual bladed robot apparatus and associated method 14 2001
6,752,585 Method and apparatus for transferring a semiconductor substrate 27 2001
6,579,730 Monitoring process for oxide removal 14 2001
2004/0020,601 Process and an integrated tool for low k dielectric deposition including a pecvd capping module 69 2003
 
ASML HOLDING N.V. (12)
5,670,210 Method of uniformly coating a substrate 54 1995
6,177,133 Method and apparatus for adaptive process control of critical dimensions during spin coating process 20 1997
6,254,936 Environment exchange control for material on a wafer surface 22 1998
6,533,531 Device for handling wafers in microelectronic manufacturing 16 1998
6,418,356 Method and apparatus for resolving conflicts in a substrate processing system 26 1999
6,238,735 Method of uniformly coating a substrate 23 1999
6,678,572 Recipe cascading in a wafer processing system 28 2000
6,468,586 Environment exchange control for material on a wafer surface 14 2000
6,780,461 Environment exchange control for material on a wafer surface 13 2001
6,662,466 Method for two dimensional adaptive process control of critical dimensions during spin coating process 16 2001
6,770,424 Wafer track apparatus and methods for dispensing fluids with rotatable dispense arms 24 2002
6,768,930 Method and apparatus for resolving conflicts in a substrate processing system 18 2003
 
FSI INTERNATIONAL, INC. (7)
4,609,575 Method of apparatus for applying chemicals to substrates in an acid processing system 35 1984
4,682,614 Wafer processing machine 31 1985
4,664,133 Wafer processing machine 42 1986
5,169,408 Apparatus for wafer processing with in situ rinse 145 1990
5,418,382 Substrate location and detection apparatus 36 1993
6,165,273 Equipment for UV wafer heating and photochemistry 23 1997
6,158,446 Ultra-low particle semiconductor cleaner 79 1998
 
SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD. (7)
5,843,527 Coating solution applying method and apparatus 40 1996
5,989,632 Coating solution applying method and apparatus 30 1997
5,976,620 Coating solution applying method and apparatus 19 1997
5,984,540 Developing apparatus and developing method 20 1997
6,440,218 Coating solution applying method and apparatus 19 1999
7,357,842 Cluster tool architecture for processing a substrate 26 2005
7,699,021 Cluster tool substrate throughput optimization 10 2006
 
SEMICONDUCTOR SYSTEMS, INC. (6)
5,427,820 Thermal control line for delivering liquid to a point of use in a photolithography system 19 1993
5,443,348 Cassette input/output unit for semiconductor processing system 26 1993
5,553,994 Thermal process module for substrate coat/develop system 16 1994
5,651,823 Clustered photolithography system 75 1995
5,766,824 Method and apparatus for curing photoresist 24 1995
5,935,768 Method of processing a substrate in a photolithography system utilizing a thermal process module 25 1997
 
SOKUDO CO., LTD. (6)
5,766,671 Method of an apparatus for forming film on substrate by sensing atmospheric pressure 31 1996
5,762,709 Substrate spin coating apparatus 33 1996
6,403,924 Apparatus for and method of heat treatment and substrate processing apparatus 22 2000
6,752,544 Developing apparatus and developing method 11 2002
6,645,880 Treating solution applying method 14 2002
6,869,234 Developing apparatus and developing method 13 2003
 
TEL FSI, INC. (5)
5,431,700 Vertical multi-process bake/chill apparatus 49 1994
6,235,641 Method and system to control the concentration of dissolved gas in a liquid 26 1998
6,251,195 Method for transferring a microelectronic device to and from a processing chamber 15 1999
6,694,224 Control of robotic systems 23 2002
6,822,413 Systems and methods incorporating an end effector with a rotatable and/or pivotable body and/or an optical sensor having a light path that extends along a length of the end effector 20 2003
 
CFMT, INC. (4)
4,917,123 Apparatus for treating wafers with process fluids 149 1988
4,984,597 Apparatus for rinsing and drying surfaces 155 1989
6,143,087 Methods for treating objects 35 1999
6,348,101 Methods for treating objects 25 2000
 
KABUSHIKI KAISHA TOSHIBA (4)
6,059,880 Coating apparatus 30 1997
5,968,268 Coating apparatus and coating method 31 1998
6,200,633 Coating apparatus and coating method 20 1999
2001/0024,691 Semiconductor substrate processing apparatus and method 32 2001
 
TOKYO ELECTRON KYUSHU LIMITED (4)
D341418 Supply nozzle for applying liquid resist to a semiconductor wafer 16 1991
5,252,137 System and method for applying a liquid 58 1991
5,312,487 Coating apparatus 42 1992
5,374,312 Liquid coating system 67 1993
 
ASML US, INC. (3)
5,733,024 Modular system 51 1995
6,616,394 Apparatus for processing wafers 16 1998
6,327,793 Method for two dimensional adaptive process control of critical dimensions during spin coating process 23 2000
 
KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.) (3)
6,874,513 High pressure processing apparatus 22 2002
6,823,880 High pressure processing apparatus and high pressure processing method 16 2002
6,703,316 Method and system for processing substrate 15 2002
 
HITACHI, LTD. (2)
5,197,846 Six-degree-of-freedom articulated robot mechanism and assembling and working apparatus using same 53 1990
6,273,104 Method of and apparatus for processing substrate 53 1996
 
MITSUBISHI PAPER MILLS LIMITED (2)
5,839,011 Apparatus for processing photosensitive material 15 1997
5,887,214 Apparatus for processing photosensitive material 13 1997
 
SILICON VALLEY GROUP, INC. (2)
5,700,046 Wafer gripper 80 1995
6,694,218 Method and apparatus for resolving conflicts in a substrate processing system 17 2002
 
ADVANCED MICRO DEVICES, INC. (1)
6,458,607 Using UV/VIS spectrophotometry to regulate developer solution during a development process 11 2001
 
ARCUS TECHNOLOGY, INC. (1)
* 2007/0231,109 APPARATUS AND METHOD FOR PROCESSING SUBSTRATES USING ONE OR MORE VACUUM TRANSFER CHAMBER UNITS 13 2007
 
AVIZA TECHNOLOGY, INC. (1)
* 6,846,149 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system 28 2001
 
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (1)
6,556,893 Robotic system control 16 2002
 
CFM TECHNOLOGIES RESEARCH ASSOCIATES, 501 GORDON DR., LIONVILLE, PA A PA LIMITED PARTNERSHIP (1)
4,911,761 Process and apparatus for drying surfaces 124 1988
 
CUTEK RESEARCH, INC. (1)
6,179,982 Introducing and reclaiming liquid in a wafer processing chamber 28 1998
 
EATON CORPORATION (1)
5,415,890 Modular apparatus and method for surface treatment of parts with liquid baths 65 1994
 
FREESCALE SEMICONDUCTOR, INC. (1)
6,284,616 Circuit and method for reducing parasitic bipolar effects during electrostatic discharges 15 2000
 
GENMARK AUTOMATION, INC. (1)
6,142,722 Automated opening and closing of ultra clean storage containers 56 1998
 
GLOBAL ADVANCED METALS, USA, INC. (1)
6,893,513 High purity tantalum, products containing the same, and methods of making the same 23 2001
 
GLOBALFOUNDRIES INC. (1)
6,579,733 Using scatterometry to measure resist thickness and control implant 14 2002
 
KAWASAKI JUKOGYO KABUSHIKI KAISHA (1)
6,438,449 Substrate transport apparatus and transport teaching system 21 2000
 
MATTSON TECHNOLOGY, INC. (1)
2004/0091,349 Methods for transporting wafers for vacuum processing 22 2003
 
MITSUBISHI DENKI KABUSHIKI KAISHA (1)
5,054,332 Articulated robot 24 1989
 
NANOMETRICS INCORPORATED (1)
6,885,467 Method and apparatus for thickness decomposition of complicated layer structures 37 2002
 
SAMSUNG ELECTRONICS CO., LTD. (1)
* 6,996,453 Substrate processing apparatus and method of processing substrate while controlling for contamination in substrate transfer module 12 2003
 
SANKYO SEIKI MFG. CO., LTD. (1)
6,491,491 Articulated robot 22 1998
 
SEIKO INSTRUMENTS INC. (1)
6,312,177 Line printer 11 1999
 
SEZ NORTH AMERICA, INC. (1)
6,109,677 Apparatus for handling and transporting plate like substrates 67 1998
 
SHIN-ETSU CHEMICAL CO., LTD. (1)
6,878,501 Polymer, chemically amplified resist composition and patterning process 18 2001
 
SIEMENS AKTIENGESELLSCHAFT (1)
5,031,474 Industrial robot 14 1989
 
SONY CORPORATION (1)
5,634,377 Articulated robot 21 1995
 
TEXAS INSTRUMENTS INCORPORATED (1)
6,076,652 Assembly line system and apparatus controlling transfer of a workpiece 52 1994
 
TOKYO ELECTRON KYUSHU LIMITED 50% (1)
5,405,443 Substrates processing device 38 1993
 
W.C. HERAEUS GMBH (1)
4,844,746 Method of producing a tantalum stock material of high ductility 27 1988
 
Other [Check patent profile for assignment information] (1)
6,669,782 Method and apparatus to control the formation of layers useful in integrated circuits 36 2000
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
APPLIED MATERIALS, INC. (2)
* 8,886,354 Methods, systems and apparatus for rapid exchange of work material 0 2010
8,550,031 Cluster tool architecture for processing a substrate 1 2012
 
NOVELLUS SYSTEMS, INC. (2)
* 8,060,252 High throughput method of in transit wafer position correction in system using multiple robots 2 2007
8,489,237 High throughput method of in transit wafer position correction in a system using multiple robots 0 2011
 
SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD. (2)
8,545,118 Substrate treating apparatus with inter-unit buffers 2 2008
8,708,587 Substrate treating apparatus with inter-unit buffers 1 2013
 
SOKUDO CO., LTD. (1)
* 8,851,008 Parallel substrate treatment for a plurality of substrate treatment lines 0 2008
 
TOKYO ELECTRON LIMITED (1)
* 8,206,076 Substrate processing system 1 2008
 
Other [Check patent profile for assignment information] (1)
8,911,193 Substrate processing sequence in a cartesian robot cluster tool 0 2011
* Cited By Examiner

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