Selective silicide process
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United States of America Patent
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Apr 19, 2011
Grant Date -
Jun 24, 2010
app pub date -
Dec 19, 2008
filing date -
Dec 19, 2008
priority date (Note) -
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Abstract
A method of self-aligned silicidation on structures having high aspect ratios involves depositing a metal oxide film using atomic layer deposition (ALD) and converting the metal oxide film to metal film in order to obtain uniform step coverage. The substrate is then annealed such that the metal in regions directly overlying the patterned and exposed silicon reacts with the silicon to form uniform metal silicide at the desired locations.
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