Electrical conditioning of MEMS device and insulating layer thereof
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United States of America Patent
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Apr 26, 2011
Grant Date -
Dec 24, 2009
app pub date -
Jun 16, 2009
filing date -
Feb 22, 2006
priority date (Note) -
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Abstract
A method of fabricating a MEMS device includes conditioning of an insulating layer by applying a voltage across the insulating layer via a conductive sacrificial layer for a period of time, prior to removal of the conductive sacrificial layer. This conditioning process may be used to saturate or stabilize charge accumulated within the insulating layer. The resistance across the insulating layer may also be measured to detect possible defects in the insulating layer.
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