Altering pattern data based on measured optical element characteristics
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United States of America Patent
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May 3, 2011
Grant Date -
Dec 20, 2007
app pub date -
Jun 19, 2006
filing date -
Jun 19, 2006
priority date (Note) -
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Abstract
A system and method are used to compensate for distortions or aberrations in an image formed in a projection system. Pattern data is generated corresponding to features to be formed on a substrate. At least one of aberrations and distortions of a projection optical system are measured. The pattern data is altered based on the measuring step. The altered pattern data is transmitted to a patterning device to control individually controllable elements coupled to the patterning device. Non uniformities in one or both of a field and pupil of an illumination system can also be measured and used to alter the pattern data.
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