Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
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United States of America Patent
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May 17, 2011
Grant Date -
Oct 23, 2008
app pub date -
Apr 18, 2008
filing date -
Apr 20, 2007
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Abstract
A photomask for integrated circuit production for development of integrated circuit components, where the integrated circuit production uses a radiation source that generates a source image, includes a substrate with one or more layers disposed thereon; a source separator element that separates the source image into one or more duplicate source images; one or more polarizing elements each corresponding to one of the one or more duplicate source images; and one or more sensors each corresponding to one of the one or more polarizing elements, the one or more sensors sensing one or more radiation characteristics of the radiation source.
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