Manufacturing method of liquid discharge head and orifice plate
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United States of America Patent
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Jun 7, 2011
Grant Date -
Apr 3, 2008
app pub date -
Sep 14, 2007
filing date -
Oct 3, 2006
priority date (Note) -
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Abstract
There is disclosed a manufacturing method in which depths of individual liquid chambers can be set to be small. The manufacturing method is a manufacturing method of a liquid discharge head having a liquid chamber which communicates with a discharge port for discharging a liquid, and includes: etching a first Si layer of an SOI substrate by use of an insulating layer as an etching stop layer to form the liquid chamber at the first Si layer, the SOI substrate being constituted by the first Si layer, the insulating layer and a second Si layer in this order; and removing a part or all of the second Si layer.
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