Sputtering target material

United States of America Patent

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Jun 14, 2011
Grant Date
Jun 7, 2007
app pub date
Oct 8, 2004
filing date
Oct 16, 2003

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Abstract

This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.

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Patent Owner(s)

Patent Owner	Address
ISHIFUKU METAL INDUSTRY CO LTD	CHIYODA-KU TOKYO 101-0047

International Classification(s)

C22C:ALLOYS

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hasegawa, Koichi	Soka, JP	131	1005
Ishii, Nobuo	Soka, JP	83	3487

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Sputtering target material

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United States of America Patent

10575725

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PATENT NO	7959746
APP PUB NO	20070128456A1
SERIAL NO	10575725
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
June 14, 2011	US,7959746,B2 US7959746B2	GRANTED PATENT AS SECOND PUBLICATION
June 07, 2007	US,20070128456,A1 US20070128456A1	FIRST PUBLISHED PATENT APPLICATION

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10575725

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